Atomic/molecular layer deposition: a direct gas-phase route to crystalline metal-organic framework thin films.
نویسندگان
چکیده
Atomic/molecular layer deposition offers us an elegant way of fabricating crystalline copper(ii)terephthalate metal-organic framework (MOF) thin films on various substrate surfaces. The films are grown from two gaseous precursors with a digital atomic/molecular level control for the film thickness under relatively mild conditions in a simple and fast one-step process.
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ورودعنوان ژورنال:
- Chemical communications
دوره 52 6 شماره
صفحات -
تاریخ انتشار 2016